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Hiring Company | ルネサス エレクトロニクス株式会社 |
Location | Ehime Prefecture |
Job Type | Permanent Full-time |
Salary | 8 million yen ~ 9 million yen |
【求人No NJB2133826】
【担当技術】
SiCエピタキシャル成長プロセス開発エンジニア
【担当業務】
SiCエピタキシャル成長装置立ち上げ、プロセス条件出し、量産化
【担当職場】
自社前工程国内拠点
Minimum Experience Level | No experience |
Career Level | Mid Career |
Minimum English Level | Business Level |
Minimum Japanese Level | Native |
Minimum Education Level | Bachelor's Degree |
Visa Status | Permission to work in Japan required |
【MUST】
SiCエピタキシャル成長プロセス開発の従事経験が2年以上あること。
【WANT】
4年制大学または大学院にて工学、化学、物理学等を修了していること。
Job Type | Permanent Full-time |
Salary | 8 million yen ~ 9 million yen |
Work Hours | 08:30 ~ 17:15 |
Holidays | 【有給休暇】初年度 23日 1か月目から 【休日】完全週休二日制 土 日 祝日 夏季休暇 年末年始 【有給休暇】入社月に付与(… |
Industry | Electronics, Semiconductor |